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Optical, compositional and structural properties of pulsed laser deposited nitrogen-doped Titanium-dioxide
Univ Szeged, Dept Opt & Quantum Elect, Szeged, Hungary; ELI HU Nonprofit Ltd, Szeged, Hungary.
Univ Szeged, Hungarian Acad Sci, Res Grp Laser Phys, Szeged, Hungary.
Univ Szeged, Dept Opt & Quantum Elect, Szeged, Hungary.
Univ Szeged, Hungarian Acad Sci, React Kinet Res Grp, Szeged, Hungary.
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2018 (English)In: Applied Surface Science, ISSN 0169-4332, E-ISSN 1873-5584, Vol. 433, p. 149-154Article in journal (Refereed) Published
Abstract [en]

N-doped TiO2 thin films were prepared using pulsed laser deposition by ablating metallic Ti target with pulses of 248 nm wavelength, at 330 °C substrate temperature in reactive atmospheres of N2/O2 gas mixtures. These films were characterized by spectroscopic ellipsometry, X-ray photoelectron spectroscopy and X-ray diffraction. Optical properties are presented as a function of the N2 content in the processing gas mixture and correlated to nitrogen incorporation into the deposited layers. The optical band gap values decreased with increasing N concentration in the films, while a monotonically increasing tendency and a maximum can be observed in case of extinction coefficient and refractive index, respectively. It is also shown that the amount of substitutional N can be increased up to 7.7 at.%, but the higher dopant concentration inhibits the crystallization of the samples.

Place, publisher, year, edition, pages
2018. Vol. 433, p. 149-154
Keywords [en]
TiONx, Photocatalytic material, PLD, Ellipsometry, Chemical composition, Structural property
National Category
Materials Chemistry Atom and Molecular Physics and Optics
Identifiers
URN: urn:nbn:se:uu:diva-351086DOI: 10.1016/j.apsusc.2017.09.181ISI: 000418883800019OAI: oai:DiVA.org:uu-351086DiVA, id: diva2:1207125
Available from: 2018-05-18 Created: 2018-05-18 Last updated: 2018-05-18Bibliographically approved

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Ottosson, Mikael

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