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Discharge runaway in high power impulse magnetron sputtering of carbon: the effect of gas pressure, composition and target peak voltage
Natl Inst Optoelect, 409 Atomistilor St,POB MG 05, Magurele, Romania.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
Natl Inst Optoelect, 409 Atomistilor St,POB MG 05, Magurele, Romania.
Natl Inst Optoelect, 409 Atomistilor St,POB MG 05, Magurele, Romania.
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2018 (English)In: Journal of Physics D: Applied Physics, ISSN 0022-3727, E-ISSN 1361-6463, Vol. 51, no 16, article id 165201Article in journal (Refereed) Published
Abstract [en]

Pressure and target voltage driven discharge runaway from low to high discharge current density regimes in high power impulse magnetron sputtering of carbon is investigated. The main purpose is to provide a meaningful insight of the discharge dynamics, with the ultimate goal to establish a correlation between discharge properties and process parameters to control the film growth. This is achieved by examining a wide range of pressures (2-20 mTorr) and target voltages (700-850 V) and measuring ion saturation current density at the substrate position. We show that the minimum plasma impedance is an important parameter identifying the discharge transition as well as establishing a stable operating condition. Using the formalism of generalized recycling model, we introduce a new parameter, 'recycling ratio', to quantify the process gas recycling for specific process conditions. The model takes into account the ion flux to the target, the amount of gas available, and the amount of gas required for sustaining the discharge. We show that this parameter describes the relation between the gas recycling and the discharge current density. As a test case, we discuss the pressure and voltage driven transitions by changing the gas composition when adding Ne into the discharge. We propose that standard Ar HiPIMS discharges operated with significant gas recycling do not require Ne to increase the carbon ionization.

Place, publisher, year, edition, pages
IOP PUBLISHING LTD , 2018. Vol. 51, no 16, article id 165201
Keywords [en]
magnetron sputtering, carbon sputtering, gas recycling, high power impulse magnetron sputtering (HiPIMS), diamond like carbon (DLC)
National Category
Fusion, Plasma and Space Physics Engineering and Technology
Identifiers
URN: urn:nbn:se:uu:diva-353101DOI: 10.1088/1361-6463/aab590ISI: 000428686500001OAI: oai:DiVA.org:uu-353101DiVA, id: diva2:1216198
Funder
VINNOVAAvailable from: 2018-06-11 Created: 2018-06-11 Last updated: 2018-06-14Bibliographically approved

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Aijaz, AsimKubart, Tomas

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