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Corrosion properties of CVD grown Ti(C,N) coatings in 3.5 wt-% NaCl environment
Uppsala University, Disciplinary Domain of Science and Technology, Chemistry, Department of Chemistry - Ångström, Inorganic Chemistry. Sandvik Coromant AB, Hägersten, Sweden.ORCID iD: 0000-0002-2361-959X
Uppsala University, Disciplinary Domain of Science and Technology, Chemistry, Department of Chemistry - Ångström, Inorganic Chemistry.
Sandvik Coromant AB, Hägersten, Sweden.
Seco Tools AB, Fagersta, Sweden.
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2018 (English)In: Corrosion Engineering, Science and Technology, ISSN 1478-422X, E-ISSN 1743-2782, Vol. 53, no 4, p. 316-320Article in journal (Refereed) Published
Abstract [en]

The corrosion behaviour of Titanium carbonitride (Ti(C,N)) films grown by chemical vapour deposition was analysed in artificial sea water environment. From potentiodynamic polarisation curves, two passivation zones were detected, which originated from an initial oxidation of TiC and TiN to TiO2 followed by growth of the TiO2 layer upon increased polarisation. X-ray photoelectron spectroscopy analyses verified the mechanism by detecting a gradual decrease in Ti(C,N) peaks accompanied by a gradual increase of oxidised Ti (e.g. TiO2). It was likewise found that carbon in TiC mainly decomposes into carbonate species while the nitrogen in TiN remains elemental and likely escapes as nitrogen gas. Accordingly, Ti(C,N) behaves like a superposition of TiC and TiN with their individual oxidation behaviour, resulting in a highly corrosion resistant material.

Place, publisher, year, edition, pages
2018. Vol. 53, no 4, p. 316-320
Keywords [en]
Corrosion, Ti(C, N), CVD, XPS
National Category
Materials Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-355699DOI: 10.1080/1478422X.2018.1467150ISI: 000431534000010OAI: oai:DiVA.org:uu-355699DiVA, id: diva2:1230860
Funder
Swedish Foundation for Strategic Research , RMA15-0048]Available from: 2018-07-04 Created: 2018-07-04 Last updated: 2018-07-04Bibliographically approved

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von Fieandt, LinusJohansson, KristinaBoman, MatsRehnlund, David

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