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Substoichiometry and tantalum dependent thermal stability of alpha-structured W-Ta-B thin films
TU Wien, Inst Mat Sci & Technol, Christian Doppler Lab Applicat Oriented Coating D, A-1060 Vienna, Austria.
TU Wien, Inst Mat Sci & Technol, Christian Doppler Lab Applicat Oriented Coating D, A-1060 Vienna, Austria.
Uppsala University, Disciplinary Domain of Science and Technology, Physics, Department of Physics and Astronomy, Applied Nuclear Physics.
Uppsala University, Disciplinary Domain of Science and Technology, Physics, Department of Physics and Astronomy, Applied Nuclear Physics.ORCID iD: 0000-0002-5815-3742
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2018 (English)In: Scripta Materialia, ISSN 1359-6462, E-ISSN 1872-8456, Vol. 155, p. 5-10Article in journal (Refereed) Published
Abstract [en]

Physical vapor deposited (PVD) WB2 thin films crystallize in the alpha-AIB(2)-prototype structure rather than in their thermodynamically stable (omega-W2B5-z-prototype structure. Contrary to the majority of alpha-AlB2-type transition metal diborides (TMB2), alpha-WB2 exhibits a more ductile character. Combining density functional theory and sophisticated experiments, we show that the stability of alpha-WB2 thin films is basically influenced by point defects such as vacancies present in PVD materials. With the help of alpha-TaB2 (one of the most ductile TMB2 with high preference for alpha-AlB2-type), the thermally driven decomposition and phase transformation of alpha-W1-xTaxB2-z to the omega-W2B5-z-type can be shifted to temperatures above 1200 degrees C.

Place, publisher, year, edition, pages
2018. Vol. 155, p. 5-10
Keywords [en]
W-Ta-B, Thin films, Boron vacancies, Density functional theory (DFT), UHTC
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-363093DOI: 10.1016/j.scriptamat.2018.06.005ISI: 000440958000002OAI: oai:DiVA.org:uu-363093DiVA, id: diva2:1256377
Available from: 2018-10-16 Created: 2018-10-16 Last updated: 2018-10-16Bibliographically approved

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Paneta, ValentinaPrimetzhofer, Daniel

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