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Self-Aligned Molding Technology (SAMT) for Fabrication of 3D Structures with a Foldable Imprint Mold
Institute of Nanostructure Technologies and Analytics (INA) and Center for Interdisciplinary Nanostructure Science and Technology (CINSaT), Heinrich‐Plett‐Strasse 40, 34132 Kassel, Germany.ORCID iD: 0000-0002-1323-7176
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics. Institute of Nanostructure Technologies and Analytics (INA) and Center for Interdisciplinary Nanostructure Science and Technology (CINSaT), Heinrich‐Plett‐Strasse 40, 34132 Kassel, Germany.
Institute of Nanostructure Technologies and Analytics (INA) and Center for Interdisciplinary Nanostructure Science and Technology (CINSaT), Heinrich‐Plett‐Strasse 40, 34132 Kassel, Germany.
Institute of Nanostructure Technologies and Analytics (INA) and Center for Interdisciplinary Nanostructure Science and Technology (CINSaT), Heinrich‐Plett‐Strasse 40, 34132 Kassel, Germany.
2019 (English)In: Applied Nanoscience, ISSN 2190-5509, E-ISSN 2190-5517, Vol. 9, no 6, p. 1255-1263Article in journal (Refereed) Published
Abstract [en]

We propose self-aligned molding technology (SAMT) as a novel nanoimprint technique with a self-aligned foldable imprint mold to control size and shape of structures and particles for a broad range of materials. SAMT is a single-step molding process for complex 3D shaped structures and particles using a reusable double-sided mold with a hinge. We present the fabrication process of SAMT molds, including electron beam lithography on a sloped surface, angular dry etching, and a template-based double inversion technique. We present fabricated SAMT molds and molding results of micro-scale 3D structures.

Place, publisher, year, edition, pages
2019. Vol. 9, no 6, p. 1255-1263
National Category
Nano Technology
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URN: urn:nbn:se:uu:diva-383610DOI: 10.1007/s13204-019-01050-0ISI: 000482243100001OAI: oai:DiVA.org:uu-383610DiVA, id: diva2:1316546
Available from: 2019-05-19 Created: 2019-05-19 Last updated: 2019-10-03Bibliographically approved

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Jablonka, Lukas

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