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Multicomponent Hf-Nb-Ti-V-Zr nitride coatings by reactive magnetronsputter deposition
Uppsala University, Disciplinary Domain of Science and Technology, Chemistry, Department of Chemistry - Ångström, Inorganic Chemistry. (Oorganisk kemi)ORCID iD: 0000-0001-7266-0022
Uppsala University, Disciplinary Domain of Science and Technology, Chemistry, Department of Chemistry - Ångström, Inorganic Chemistry. (Oorganisk kemi)ORCID iD: 0000-0001-8617-4834
2018 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 49, no 15 sept, p. 529-539Article in journal (Refereed) Published
Abstract [en]

Multicomponent nitride coatings of the Hf-Nb-Ti-V-Zr system with different Hf content (0–18 at.%) were deposited using reactive dc magnetron sputtering. Coatings with lower Hf content (0–7 at.%) were found to consist of a single solid solution phase with NaCl-type structure (space group Fm-3" role="presentation">m). Coatings with higher Hf content (10–18 at.%) showed a two-phase material consisting of cubic Fm-3" role="presentation">m and tetragonal I4/mmm solid solution phase. The lattice distortion, estimated by calculating the δ-parameter under the assumption of a single solid solution phase, varied between 3.8 and 4.0% and slightly decreased with increasing Hf content. SEM and TEM cross section images showed a columnar microstructure with columns that were frayed on the surface or throughout the whole column. The column size decreased as Hf content increased. The hardness increased from 8 to 19 GPa with increased Hf content, which most probably is related to the change in microstructure rather than change in lattice distortion. The electrical resistivity for all samples ranged between 231 and 286 μΩcm.

Place, publisher, year, edition, pages
2018. Vol. 49, no 15 sept, p. 529-539
National Category
Inorganic Chemistry
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URN: urn:nbn:se:uu:diva-392699DOI: 10.1016/j.surfcoat.2018.06.030OAI: oai:DiVA.org:uu-392699DiVA, id: diva2:1349293
Available from: 2019-09-08 Created: 2019-09-08 Last updated: 2019-10-09Bibliographically approved

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Johansson, KristinaLewin, Erik

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