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Sandwiched Polyethylene Shrink Film Masking with Tunable Resolution and Shape for Liquid Alloy Patterning
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Microsystems Technology. Huazhong Univ Sci & Technol, State Key Lab Digital Mfg Equipment & Technol, Wuhan 430074, Hubei, Peoples R China.
Huazhong Univ Sci & Technol, State Key Lab Digital Mfg Equipment & Technol, Wuhan 430074, Hubei, Peoples R China.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Microsystems Technology.ORCID iD: 0000-0003-2744-1634
Southern Univ Sci & Technol, Dept Mat Sci & Engn, Shenzhen 518055, Peoples R China.
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2019 (English)In: ACS APPLIED POLYMER MATERIALS, ISSN 2637-6105, Vol. 1, no 2, p. 145-151Article in journal (Refereed) Published
Abstract [en]

Among numerous patterning techniques, masked liquid alloy printing is one of the most promising techniques for scalable fabrication of liquid-alloy-based stretchable electronics. Like any other mask-based process, its resolution is often constrained by the quality of the mask, and the fabrication cost increases drastically with increased resolution. In this work, by introducing a sandwiched thermal shrink polymer film masking technique and a corresponding intermediate release agent, fine liquid alloy patterns were demonstrated by using a mechanical cutting plotter together with a common oven. The final resolution and shape of the mask could be tuned based on the anisotropy of the shrink polymer film and other operational parameters of the technique. After shrinkage, the width of the patterned liquid alloy lines and space in-between could be tuned to less than one third of the original cut pattern, to about 35 and 60 mu m, respectively, according to requirements. To better predict the final structure, several parameters were investigated experimentally and numerically. Finally, a liquid alloy strain sensor and three-dimensional conformal masking were demonstrated, showing the potential of the developed technique.

Place, publisher, year, edition, pages
2019. Vol. 1, no 2, p. 145-151
Keywords [en]
masking, shrink film, resolution tuning, 3D conformal masking, liquid alloy patterning
National Category
Other Materials Engineering
Identifiers
URN: urn:nbn:se:uu:diva-392067DOI: 10.1021/acsapm.8b00010ISI: 000476966600007OAI: oai:DiVA.org:uu-392067DiVA, id: diva2:1349486
Available from: 2019-09-09 Created: 2019-09-09 Last updated: 2019-09-09Bibliographically approved

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Wang, BeiHjort, KlasWu, Zhigang

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