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A Sequential Process of Graphene Exfoliation and Site-Selective Copper/Graphene Metallization Enabled by Multifunctional 1‑Pyrenebutyric Acid Tetrabutylammonium Salt
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Nanotechnology and Functional Materials.
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2019 (English)In: ACS Appl. Mater. Interfaces, ISSN 1944-8244, Vol. 11, p. 6448-6455Article in journal (Refereed) Published
Abstract [en]

This paper reports a procedure leading to shear exfoliation of pristine few-layer graphene flakes in water and subsequent site-selective formation of Cu/graphene films on polymer substrates, both of which are enabled by employing the water soluble 1-pyrenebutyric acid tetrabutylammonium salt (PyB-TBA). The exfoliation with PyB-TBA as an enhancer leads to as-deposited graphene films dried at 90 °C that are characterized by electrical conductivity of ∼110 S/m. Owing to the good affinity of the tetrabutylammonium cations to the catalyst PdCl42–, electroless copper deposition selectively in the graphene films is initiated, resulting in a self-aligned formation of highly conductive Cu/graphene films at room temperature. The excellent solution-phase and low-temperature processability, self-aligned copper growth, and high electrical conductivity of the Cu/graphene films have permitted fabrication of several electronic circuits on plastic foils, thereby indicating their great potential in compliant, flexible, and printed electronics.

Place, publisher, year, edition, pages
2019. Vol. 11, p. 6448-6455
National Category
Materials Chemistry
Research subject
Engineering Science with specialization in Nanotechnology and Functional Materials
Identifiers
URN: urn:nbn:se:uu:diva-398085DOI: 10.1021/acsami.8b21162OAI: oai:DiVA.org:uu-398085DiVA, id: diva2:1374511
Available from: 2019-12-02 Created: 2019-12-02 Last updated: 2020-02-06Bibliographically approved

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Sun, Rui

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