Polaron Absorption in Amorphous Tungsten Oxide Films
2001 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 90, 1860-1863 p.Article in journal (Refereed) Published
Amorphous thin films of tungsten oxide were deposited by sputtering onto glass substrates covered by conductive indium–tin oxide. The density and stoichiometry were determined by Rutherford backscattering spectrometry. Lithium ions were intercalated electrochemically into the films. The optical reflectance and transmittance were measured in the wavelength range from 0.3 to 2.5 μm, at a number of intercalation levels. The polaron absorption peak becomes more symmetric and shifts to higher energies until an intercalation level of 0.25 to 0.3 Li+/W, where a saturation occurs. The shape of the polaron peak is in very good agreement with the theory of Bryksin [Fiz. Tverd. Tela 24, 1110 (1982)]. Within this model, the shift of the absorption peak is interpreted as an increase in the Fermi level of the material as more Li ions are inserted.
Place, publisher, year, edition, pages
2001. Vol. 90, 1860-1863 p.
IdentifiersURN: urn:nbn:se:uu:diva-92421DOI: 10.1063/1.1384853OAI: oai:DiVA.org:uu-92421DiVA: diva2:165491