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Aluminium Nitride Deposition on 4H-SiC by Means of Physical Vapour Deposition
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Solid State Electronics.
In: Thin Solid FilmsArticle in journal (Refereed) Submitted
URN: urn:nbn:se:uu:diva-93981OAI: oai:DiVA.org:uu-93981DiVA: diva2:167650
Available from: 2006-01-27 Created: 2006-01-27Bibliographically approved
In thesis
1. Studies of the Reactive Sputtering Process and its Application in Electro-Acoustic Devices
Open this publication in new window or tab >>Studies of the Reactive Sputtering Process and its Application in Electro-Acoustic Devices
2006 (English)Doctoral thesis, comprehensive summary (Other academic)
Abstract [en]

Electro-acoustic devices such as surface acoustic wave (SAW) and bulk acoustic wave (BAW) devices have been in commercial use for over 60 years and can be found in applications ranging from specialised scientific and military equipment to consumer products, such as mobile telephones, TV and radio receivers, etc. Today by far the largest market for electro-acoustic devices is the telecommunication industry which annually consumes approximately three billion acoustic wave filters for frequency control alone.

The development of new materials and technologies for electro-acoustic devices has gained a substantial and growing interest from both academic and industrial research communities in recent years due to the enormous growth in the telecommunication industry and other forms of wireless data communication. One of the bigger issues has been to replace the single crystalline substrates with thin film piezoelectric materials deposited by reactive sputtering. This would not only reduce the manufacturing costs but will also enable high frequency of operation and a wider choice of substrate materials. However, in order to obtain the material properties required for the intended application a detailed theoretical description of the reactive sputtering process is necessary since the texture and other functional properties of the piezoelectric material are extremely sensitive to the process parameters in addition to the structure of the underlying material.

This thesis studies the reactive sputtering process and its application for the fabrication of thin film electro-acoustic devices. The aim has been to gain a further insight into the process and make use of this knowledge to improve the fabrication of electro-acoustic devices. In this work modelling of the reactive sputtering process has been improved by studying certain fundamental aspects of the process and in particular the dynamics of the processes taking place during sputtering both at the target and the substrate surfaces. Consequently, highly textured thin piezoelectric aluminium nitride films have been synthesized and thin film bulk acoustic resonators (FBAR) operating in the GHz range have been fabricated and studied.

Place, publisher, year, edition, pages
Uppsala: Acta Universitatis Upsaliensis, 2006. 61 p.
Digital Comprehensive Summaries of Uppsala Dissertations from the Faculty of Science and Technology, ISSN 1651-6214 ; 142
Materials science, Sputtering, Reactive Sputtering, Electro Acoustic Devices, Materialvetenskap
National Category
Materials Engineering
urn:nbn:se:uu:diva-6320 (URN)91-554-6452-1 (ISBN)
Public defence
2006-02-17, 10134, Ångström Laboratory, 10:00
Available from: 2006-01-27 Created: 2006-01-27Bibliographically approved

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