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Design and implementation of a random dopant fluctuation simulation program 'dr'
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Solid State Electronics.
In: Academic Archive OnlineArticle in journal (Refereed) Published
URN: urn:nbn:se:uu:diva-94496OAI: oai:DiVA.org:uu-94496DiVA: diva2:168363
Available from: 2006-04-25 Created: 2006-04-25Bibliographically approved
In thesis
1. Advanced TCAD Simulations and Characterization of Semiconductor Devices
Open this publication in new window or tab >>Advanced TCAD Simulations and Characterization of Semiconductor Devices
2006 (English)Doctoral thesis, comprehensive summary (Other academic)
Abstract [en]

Today, micro- and nano-electronic devices are becoming more complex and advanced as the dimensions are shrinking. It is therefore a very challenging task to develop new device technologies with performance that can be predicted. This thesis focuses on advanced measurement techniques and TCAD simulations in order to characterize and understand the device physics of advanced semiconductor devices.

TCAD simulations were made on a novel MOSFET device with asymmetric source and drain structures. The results showed that there exists an optimum range of implantation doses where the device has a significantly higher figure-of-merit regarding speed and voltage capability, compared to a symmetric MOSFET. Furthermore, both 2D and 3D simulations were used to develop a resistive model of the substrate noise coupling.

Of particular interest to this thesis is the random dopant fluctuation (RDF). The result of RDF can be characterized using very advance and reliable measurement techniques. In the thesis an ultra-high precision parametric mismatch measurement system was designed and implemented. The best ever reported performance on short-term repeatability of the measurements was demonstrated. A new bipolar parametric mismatch phenomenon was also revealed using the measurement system.

A complete simulation platform, called SiSPET (Simulated Statistical Parameter Extraction Tool), was developed and integrated into the framework of a commercial TCAD environment. A special program for randomization of the doping was developed and proven to provide RDF effects in agreement measurement. The SiSPET system was used to investigate how different device models were able to take RDF effects into account. The RDF effects were translated in to parameter fluctuations using the developed extraction routines. It was shown that the basic MOSFET fluctuation model could be improved by including the field dependenent mobility. However, if a precise description of the fluctuations is required an advanced compact-model, such as MOS Model 11 should be used.

Place, publisher, year, edition, pages
Uppsala: Acta Universitatis Upsaliensis, 2006. viii+50 p.
Digital Comprehensive Summaries of Uppsala Dissertations from the Faculty of Science and Technology, ISSN 1651-6214 ; 182
Electronics, MOSFET, RDF, random dopant fluctuation, asymmetric, parametric mismatch, TCAD, compact modeling, fluctuation model, Elektronik
urn:nbn:se:uu:diva-6883 (URN)91-554-6567-6 (ISBN)
Public defence
2006-05-16, Häggsalen, Ångströmlaboratoriet, Lägerhyddsvägen 1, Uppsala, 09:30
Available from: 2006-04-25 Created: 2006-04-25Bibliographically approved

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