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Atomic layer deposition of iron oxide thin films and nano-tubes using ferrocene and oxygen as precursors
Uppsala University, Disciplinary Domain of Science and Technology, Chemistry, Department of Materials Chemistry.
Uppsala University, Disciplinary Domain of Science and Technology, Chemistry, Department of Materials Chemistry.
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2008 (English)In: Chemical Vapor Deposition, ISSN 0948-1907, Vol. 14, no 3-4, 67-70 p.Article in journal (Refereed) Published
Abstract [en]

Thin films and nanotubes of iron oxide are deposited using atomic layer deposition (ALD) on Si(100) and anodic aluminum oxide (AAO), respectively. Ferrocene, Fe(Cp)(2), and oxygen are used as precursors. Successful depositions are carried out in the temperature range 350-500 degrees C on Si(100), while all depositions on AAO are made at 400 degrees C. The growth per cycle values are around 0.14 nm on Si(100) in the temperature range 350-500 degrees C and 0.06 nm on AAO. Below 500 degrees C, the iron oxide crystallizes as a phase mixture on both types of substrates. One of the phases is identified as the rhombohedral Fe2O3 phase (hematite), but the second phase cannot be unambiguously identified. Above 500 degrees C, only phase pure hematite is detected. For deposition of nanotubes, in-house made AAO membranes are used, having an aspect ratio of 30. By etching of the AAO membranes after deposition, free-standing nanotubes retaining the order of the AAO template can be fabricated.

Place, publisher, year, edition, pages
2008. Vol. 14, no 3-4, 67-70 p.
Keyword [en]
anodic aluminum oxide, atomic layer deposition, iron oxide, nanotubes, thin films
National Category
Chemical Sciences
URN: urn:nbn:se:uu:diva-97310DOI: 10.1002/cvde.200706649ISI: 000255622300001OAI: oai:DiVA.org:uu-97310DiVA: diva2:172186
Available from: 2008-05-14 Created: 2008-05-14 Last updated: 2009-11-05Bibliographically approved
In thesis
1. Metal Oxide Thin Films and Nanostructures Made by ALD
Open this publication in new window or tab >>Metal Oxide Thin Films and Nanostructures Made by ALD
2008 (English)Doctoral thesis, comprehensive summary (Other academic)
Abstract [en]

Thin films of cobalt oxide, iron oxide and niobium oxide, and nanostructured thin films of iron oxide, titanium oxide and multilayered iron oxide/titanium oxide have been deposited by Atomic Layer Deposition (ALD). The metal oxides were grown using the precursor combinations CoI2/O2, Fe(Cp)2/O2, NbI5/O2 and TiI4/H2O. The samples were analysed primarily with respect to phase content, morphology and growth characteristics.

Thin films deposited on Si (100) were found to be amorphous or polycrystalline, depending on deposition temperature and the oxide deposited; cobalt oxide was also deposited on MgO (100), where it was found to grow epitaxially with orientation (001)[100]Co3O4||(001)[100]MgO. As expected, the polycrystalline films were rougher than the amorphous or the epitaxial films. The deposition processes showed properties characteristic of self-limiting ALD growth; all processes were found to have a deposition temperature independent growth region. The deposited films contained zero or only small amounts of precursor residues.

The nanostructured films were grown using anodic aluminium oxide (AAO) or carbon nanosheets as templates. Nanotubes could be manufactured by depositing a thin film which covers the pore walls of the AAO template uniformly; free-standing nanotubes retaining the structure of the template could be fabricated by removing the template. Multilayered nanotubes could be obtained by depositing multiple layers of titanium dioxide and iron oxide in the pores of the AAO template. Carbon nanosheets were used to make titanium dioxide nanosheets with a conducting graphite backbone. The nucleation of the deposited titanium dioxide could be controlled by acid treatment of the carbon nanosheets.

Place, publisher, year, edition, pages
Uppsala: Acta Universitatis Upsaliensis, 2008. 56 p.
Digital Comprehensive Summaries of Uppsala Dissertations from the Faculty of Science and Technology, ISSN 1651-6214 ; 441
Inorganic chemistry, Atomic layer deposition, Metal oxide, Nanostructures, Template deposition, Thin films, Oorganisk kemi
urn:nbn:se:uu:diva-8898 (URN)978-91-554-7220-7 (ISBN)
Public defence
2008-06-05, Å 2005, Ångströmlaboratoriet, Lägerhyddsvägen 1, Uppsala, 10:15
Available from: 2008-05-14 Created: 2008-05-14Bibliographically approved

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