Atomic layer deposition of titanium dioxide nanostructures using carbon nanosheets as a template
2009 (English)In: Journal of Crystal Growth, ISSN 0022-0248, E-ISSN 1873-5002, Vol. 311, no 2, 373-377 p.Article in journal (Refereed) Published
Nanostructured films of anatase TiO2 is deposited on carbon nanosheet (CNS) templates using atomic layer deposition (ALD). The high-surface area of the CNS together with the unique step coverage of the ALD process makes it possible to obtain sheet-like TiO2 nanostructures, for use in potential applications, e.g. photocatalysis and photovoltaics. A problem with ALD on CNS was the low nucleation rate giving TiO2 films with pinholes. It is shown that introduction of defects by an acid-treatment process can be used to control initial nucleation and growth of the films. The TiO2 on the defect-rich CNS nucleates faster and results in a film with no observable pinholes consisting of crystalline grains in an amorphous matrix.
Place, publisher, year, edition, pages
2009. Vol. 311, no 2, 373-377 p.
ALD, Nucleation, Atomic layer epitaxy, Nanomaterials, Oxides
IdentifiersURN: urn:nbn:se:uu:diva-97311DOI: 10.1016/j.jcrysgro.2008.10.035ISI: 000263700300030OAI: oai:DiVA.org:uu-97311DiVA: diva2:172187