Direct current magnetron sputtering deposition of nanocomposite alumina – zirconia thin films
2008 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 516, no 23, 8352-8358 p.Article in journal (Refereed) Published
Mixed aluminium oxide-zirconium oxide thin solid films have been synthesized at similar to 300 degrees C by reactive direct current magnetron sputtering from two targets. Partial pressure control of the oxygen gas ensured stoichiometric films without compromising the deposition rate. The composition of the films ranged from pure alumina to pure zirconia as measured by X-ray photoelectron spectroscopy. Microstructural characterisation showed that the pure zirconium oxide films nucleated initially as the tetragonal zirconia phase, while the 100/010/001 textured monoclinic zirconia phase grew under steady-state conditions with a columnar structure. Addition of aluminiurn to similar to 3 at.% caused the formation of tetragonal zirconia in the films, while further additions led to an amorphous structure as governed by the alumina under the present kinetic limitations.
Place, publisher, year, edition, pages
2008. Vol. 516, no 23, 8352-8358 p.
Alumina, Zirconia, Dual reactive direct current magnetron sputtering, Nanocomposite, X-ray photoelectron spectroscopy, X-ray diffraction, Transmission electron microscopy
Other Electrical Engineering, Electronic Engineering, Information Engineering
IdentifiersURN: urn:nbn:se:uu:diva-105879DOI: 10.1016/j.tsf.2008.04.040ISI: 000260579800022OAI: oai:DiVA.org:uu-105879DiVA: diva2:222701