uu.seUppsala University Publications
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Direct current magnetron sputtering deposition of nanocomposite alumina – zirconia thin films
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics. (Fasta tillståndets elektronik)
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics. (Fasta tillståndets elektronik)
Show others and affiliations
2008 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 516, no 23, 8352-8358 p.Article in journal (Refereed) Published
Abstract [en]

Mixed aluminium oxide-zirconium oxide thin solid films have been synthesized at similar to 300 degrees C by reactive direct current magnetron sputtering from two targets. Partial pressure control of the oxygen gas ensured stoichiometric films without compromising the deposition rate. The composition of the films ranged from pure alumina to pure zirconia as measured by X-ray photoelectron spectroscopy. Microstructural characterisation showed that the pure zirconium oxide films nucleated initially as the tetragonal zirconia phase, while the 100/010/001 textured monoclinic zirconia phase grew under steady-state conditions with a columnar structure. Addition of aluminiurn to similar to 3 at.% caused the formation of tetragonal zirconia in the films, while further additions led to an amorphous structure as governed by the alumina under the present kinetic limitations.

Place, publisher, year, edition, pages
2008. Vol. 516, no 23, 8352-8358 p.
Keyword [en]
Alumina, Zirconia, Dual reactive direct current magnetron sputtering, Nanocomposite, X-ray photoelectron spectroscopy, X-ray diffraction, Transmission electron microscopy
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:uu:diva-105879DOI: 10.1016/j.tsf.2008.04.040ISI: 000260579800022OAI: oai:DiVA.org:uu-105879DiVA: diva2:222701
Available from: 2009-06-09 Created: 2009-06-09 Last updated: 2017-12-13Bibliographically approved

Open Access in DiVA

No full text

Other links

Publisher's full text

Authority records BETA

Kubart, TomasNyberg, Tomas

Search in DiVA

By author/editor
Kubart, TomasNyberg, Tomas
By organisation
Solid State Electronics
In the same journal
Thin Solid Films
Other Electrical Engineering, Electronic Engineering, Information Engineering

Search outside of DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 792 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf