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Temperature effect on low-k dielectric thin films studied by ERDA
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Ion Physics. (jonfysik)
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Ion Physics. (jonfysik)
2008 (English)In: Journal of Physics, Conference Series, ISSN 1742-6588, E-ISSN 1742-6596, Vol. 100, no 1, 012041- p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
2008. Vol. 100, no 1, 012041- p.
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Subatomic Physics Engineering and Technology
Research subject
Ion Physics
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URN: urn:nbn:se:uu:diva-111091DOI: 10.1088/1742-6596/100/1/012041ISI: 000275655200041OAI: oai:DiVA.org:uu-111091DiVA: diva2:279377
Available from: 2009-12-03 Created: 2009-12-03 Last updated: 2017-12-12Bibliographically approved

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Jensen, JensPossnert, Göran

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