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Stable High Rate Reactive Sputter Deposition of Aluminium Oxide from Segmented Targets of Aluminium and Aluminium Oxide
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
2009 (English)In: Presented at the International Symposium on Reactive Sputter Deposition (RSD2009),  Manchester, United Kingdom, December 10-11, 2009, 2009Conference paper, Published paper (Refereed)
Place, publisher, year, edition, pages
2009.
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Engineering and Technology
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URN: urn:nbn:se:uu:diva-121241OAI: oai:DiVA.org:uu-121241DiVA: diva2:304767
Conference
International Symposium on Reactive Sputter Deposition (RSD2009), Manchester, United Kingdom, December 10-11, 2009
Available from: 2010-03-19 Created: 2010-03-19 Last updated: 2016-04-14Bibliographically approved

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Särhammar, ErikNyberg, TomasKubart, TomasBerg, Sören

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