Cold atmospheric plasma: Sources, processes, and applications
2010 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 518, no 23, 6705-6713 p.Article in journal (Refereed) Published
Atmospheric pressure gas discharge plasmas, especially those operated at energy non-equilibrium and low gas temperatures, have recently become a subject of great interest for a wide variety of technologies including surface treatment and thin-film deposition. A driving force for these developments is the avoidance of expensive equipment required for competing vacuum-based plasma technologies. Although there are many applications where non-equilibrium (cold) plasma at atmospheric and higher pressures represents a substantial advantage, there are also a number of applications where low-pressure plasmas simply cannot be replaced due to specific properties and limitations of the atmospheric plasma and related equipment. In this critical review, the primary principles and characteristics of the cold atmospheric plasma and differences from vacuum-based plasma processes are described and discussed to provide a better understanding of the capabilities and limits of emerging atmospheric plasma technologies.
Place, publisher, year, edition, pages
2010. Vol. 518, no 23, 6705-6713 p.
Cold atmospheric plasma, Non-equilibrium plasma, Atmospheric plasma sources, Atmospheric plasma processing, Surface activation, Surface treatment and deposition
Engineering and Technology
IdentifiersURN: urn:nbn:se:uu:diva-134328DOI: 10.1016/j.tsf.2010.07.044ISI: 000282534000001OAI: oai:DiVA.org:uu-134328DiVA: diva2:372794