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Fabrication of sub-micron high aspect ratio diamond structures with nanoimprint lithography
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Microsystems Technology.
University of Joensuu, Finland.
University of Joensuu, Finland.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Microsystems Technology.
2010 (English)In: Microelectronic Engineering, ISSN 0167-9317, E-ISSN 1873-5568, Vol. 87, no 11, 2077-2080 p.Article in journal (Refereed) Published
Abstract [en]

Polycrystalline diamond with optical quality has been patterned using nanoimprint lithography. Nanoimprint lithography is a rather new method for fabrication of resist structures with features sizes down to at least 20 nm. The pattern used in this article is a grating with a period of 600 nm and a fill factor of 0.5. Using plasma etching the nanoimprinted grating is etched into a freestanding diamond substrate. We have accomplished the fabrication of 300 nm diamond features with a depth of about 2 mu m, which corresponds to an aspect ratio of 7.

Place, publisher, year, edition, pages
2010. Vol. 87, no 11, 2077-2080 p.
Keyword [en]
CVD diamond, Nanoimprint lithography, Inductively coupled plasma etching, Nanostructures
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:uu:diva-135033DOI: 10.1016/j.mee.2009.12.085ISI: 000281420900011OAI: oai:DiVA.org:uu-135033DiVA: diva2:374339
Available from: 2010-12-03 Created: 2010-12-03 Last updated: 2017-12-12

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Publisher's full texthttp://dx.doi.org/10.1016/j.mee.2009.12.085

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Karlsson, MikaelNikolajeff, Fredrik

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