Fabrication of sub-micron high aspect ratio diamond structures with nanoimprint lithography
2010 (English)In: Microelectronic Engineering, ISSN 0167-9317, E-ISSN 1873-5568, Vol. 87, no 11, 2077-2080 p.Article in journal (Refereed) Published
Polycrystalline diamond with optical quality has been patterned using nanoimprint lithography. Nanoimprint lithography is a rather new method for fabrication of resist structures with features sizes down to at least 20 nm. The pattern used in this article is a grating with a period of 600 nm and a fill factor of 0.5. Using plasma etching the nanoimprinted grating is etched into a freestanding diamond substrate. We have accomplished the fabrication of 300 nm diamond features with a depth of about 2 mu m, which corresponds to an aspect ratio of 7.
Place, publisher, year, edition, pages
2010. Vol. 87, no 11, 2077-2080 p.
CVD diamond, Nanoimprint lithography, Inductively coupled plasma etching, Nanostructures
Engineering and Technology
IdentifiersURN: urn:nbn:se:uu:diva-135033DOI: 10.1016/j.mee.2009.12.085ISI: 000281420900011OAI: oai:DiVA.org:uu-135033DiVA: diva2:374339