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Modeling of the deposition of stoichiometric Al2O3 using nonarcing direct current magnetron sputtering
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
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1998 (English)In: J Vac Sci Technol A, Vol. 16, no 3, 1286-1292 p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
1998. Vol. 16, no 3, 1286-1292 p.
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URN: urn:nbn:se:uu:diva-10185OAI: oai:DiVA.org:uu-10185DiVA: diva2:37953
Available from: 2007-03-02 Created: 2007-03-02 Last updated: 2011-01-14

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Nyberg, TomasBerg, Sören

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