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The influence of total processing pressure on the hysteresis behaviour in reactive sputtering
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
2010 (English)Conference paper, Published paper (Refereed)
Place, publisher, year, edition, pages
2010.
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:uu:diva-138819OAI: oai:DiVA.org:uu-138819DiVA: diva2:379975
Conference
18th International Vaccum Congress (IVC-18), Beijing, August 23-27, 2010
Available from: 2010-12-20 Created: 2010-12-20 Last updated: 2015-01-07Bibliographically approved

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Särhammar, ErikNyberg, TomasBerg, Sören

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CiteExportLink to record
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