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Angular dependence of the polysilicon etch rate during dry etching in SF6 and Cl2
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
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1997 (English)In: The 43rd International Symposium of the American Vacuum Society, Philadelphia PA, USA, 1997Conference paper, Published paper (Refereed)
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1997.
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URN: urn:nbn:se:uu:diva-10245OAI: oai:DiVA.org:uu-10245DiVA: diva2:38013
Available from: 2007-03-05 Created: 2007-03-05

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Katardjiev, IliaBerg, SörenBlom, Hans-Olof

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