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The Effect of Target Aging on the Structure Formation of Zinc Oxide During Reactive Sputtering
Institute of Physics (IA), RWTH Aachen University.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics. (Thin Films Group)
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics. (Thin Films Group)
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics. (Thin Films Group)
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2007 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 515, no 7-8, 3554-3558 p.Article in journal (Refereed) Published
Abstract [en]

A comparative study of reactively sputtered zinc oxide films deposited using (a) a new metallic Zn target and (b) an old one with a pronounced erosion trace is presented. Depending on the shape of the target surface there, are pronounced differences in the film structure. These findings are attributed to a correlation between the target surface profile and ion bombardment of the growing film. Main candidates for the differences in film structure are negatively charged oxygen ions generated at the oxidized target surface.

Place, publisher, year, edition, pages
2007. Vol. 515, no 7-8, 3554-3558 p.
Keyword [en]
Reactive sputtering, Zinc oxide, Negative oxygen ions
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:uu:diva-10270DOI: 10.1016/j.tsf.2006.10.130ISI: 000244825100037OAI: oai:DiVA.org:uu-10270DiVA: diva2:38038
Available from: 2007-03-09 Created: 2007-03-09 Last updated: 2017-12-11

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Kappertz, OliverNyberg, TomasBerg, Sören

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