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Focused ion beam fabrication procedures of x-ray micro Fresnel zone plates
Uppsala University, Disciplinary Domain of Science and Technology, Physics, Department of Physics and Materials Science.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Applied Materials Sciences.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Applied Materials Sciences.
Istituto di Fotonica e Nanotecnologie (CNR) Via Cineto Romano 42, 00156 Roma, Italy.
2007 (English)In: Journal of Micromechanics and Microengineering, ISSN 0960-1317, E-ISSN 1361-6439, Vol. 17, no 3, 617-622 p.Article in journal (Refereed) Published
Abstract [en]

In this paper the use of focused ion beam (FIB) mask-less lithography is presented as a novel and simple way to fabricate x-ray Fresnel zone plates (FZPs), and a prototype of a FIB-made 100 nm resolution FZP with 38 zones is described. Considerations for future developments—the maximum aspect ratio achievable by FIB lithography in nickel, a way to produce zones with a parabolic transverse profile, as theoretically required for the highest efficiency in focusing—are also reported.

Place, publisher, year, edition, pages
2007. Vol. 17, no 3, 617-622 p.
National Category
Physical Sciences Engineering and Technology
Identifiers
URN: urn:nbn:se:uu:diva-10709DOI: 10.1088/0960-1317/17/3/026OAI: oai:DiVA.org:uu-10709DiVA: diva2:38477
Available from: 2007-04-20 Created: 2007-04-20 Last updated: 2017-12-11Bibliographically approved

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Surpi, AlessandroValizadeh, SimaLeifer, Klaus

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