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The deposition rate of copper in HiPIMS is reduced by the presence of sputter gas
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
Lawrence Berkeley National Laboratory, USA.
2010 (English)In: 1st internationall conference on HiPIMS, 6-7th of July 2010, Sheffield, UK, 2010Conference paper, Published paper (Refereed)
Place, publisher, year, edition, pages
2010.
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Engineering and Technology
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URN: urn:nbn:se:uu:diva-141335OAI: oai:DiVA.org:uu-141335DiVA: diva2:385431
Conference
1st internationall conference on HiPIMS, 6-7th of July 2010, Sheffield, UK
Available from: 2011-01-11 Created: 2011-01-11 Last updated: 2016-04-18Bibliographically approved

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Andersson, Joakim

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CiteExportLink to record
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