Carbon nanopillar array deposition on SiO2 by ion irradiation through a porous alumina template
2007 (English)In: Vacuum, ISSN 0042-207X, E-ISSN 1879-2715, Vol. 82, no 3, 359-362 p.Article in journal (Refereed) Published
A method for producing ordered carbon nanopillar arrays is presented. The method is based on ion irradiation through a small anodic porous alumina membrane, resulting in carbon deposition within the centers of the pores on a gold covered SiO2/Si substrate. Samples were irradiated by 4 MeV Cl2+ ions with fluences of . The combined use of pick’n place positioning of the small porous alumina templates and ion beam irradiation is well suited for post-processing on silicon based integrated circuits. It provides fast local deposition at low temperature of high-density ordered carbon nanopillar arrays in larger silicon based systems, e.g., for field emitting or biosensors applications.
Place, publisher, year, edition, pages
2007. Vol. 82, no 3, 359-362 p.
SiO2, Carbon nanostructures, Carbon pillars, Ion lithography, Ion irradiation, Anodic porous alumina membrane
Inorganic Chemistry Subatomic Physics Engineering and Technology
Research subject Ion Physics
IdentifiersURN: urn:nbn:se:uu:diva-12714DOI: 10.1016/j.vacuum.2007.05.002ISI: 000251186800009OAI: oai:DiVA.org:uu-12714DiVA: diva2:40483