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In vitro bioactivity of Atomic Layer Deposited titanium dioxide on titanium and silicon substrates
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Applied Materials Sciences. (Tribologi)
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Applied Materials Sciences.
Uppsala University, Disciplinary Domain of Science and Technology, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Applied Materials Sciences.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Applied Materials Sciences.
2008 (English)In: BIOCERAMICS, VOL 20, PTS 1 AND 2 / [ed] Daculsi G, Layrolle P, 2008, Vol. 361-363, 689-692 p.Conference paper, Published paper (Refereed)
Abstract [en]

A non-bioactive implant device can easily be changed to in vitro bioactive with a thin This crystalline coating can be deposited very thin with great step coating of crystalline TiO2 coverage at a low temperature with Atomic Layer Deposition (ALD). An anatase TiO2 coating was built up atomic layer by atomic layer using TiI4 and H2O as precursors in a hot wall furnace. Several hundreds of cycles resulted in a 10-30nm well defined TiO2 of anatase phase on both Si and Ti substrates. These coatings were shown to be bioactive when immersed in simulated body fluid in vitro, as hydroxyapatite (HA) formed on the surface. The surface roughness of the substrates affected the adhesion of the HA. The adhesion was low on the smooth Si but much better on the 100 times rougher Ti. The ALD technique is promising for coating substrates of all shapes with bioactive crystalline TiO2 at a low temperature.

Place, publisher, year, edition, pages
2008. Vol. 361-363, 689-692 p.
Series
KEY ENGINEERING MATERIALS, ISSN 1013-9826 ; 361-363
Keyword [en]
bioactivity, atomic layer deposition (ALD), coating; TiO2, anatase, rutile
National Category
Inorganic Chemistry Engineering and Technology
Identifiers
URN: urn:nbn:se:uu:diva-12848DOI: 10.4028/www.scientific.net/KEM.361-363.689ISI: 000253480200171OAI: oai:DiVA.org:uu-12848DiVA: diva2:40618
Conference
20th International Symposium on Ceramics in Medicine Nantes, FRANCE, OCT 24-26, 2007
Available from: 2008-09-22 Created: 2008-09-22 Last updated: 2016-04-13Bibliographically approved

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Heinrichs, JannicaRooth, MårtenEngqvist, Håkan

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