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Exploitation of atomic layer deposition for nanostructured materials
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2007 (English)In: Materials science & engineering. C, biomimetic materials, sensors and systems, ISSN 0928-4931, E-ISSN 1873-0191, Vol. 27, no 5-8, 1504-1508 p.Article in journal (Refereed) Published
Abstract [en]

In making and modifying nanomaterials conformality is a prerequisite for the thin film deposition method. From its principle ALD is an ideal method for coating nanomaterials. In this paper the use of ALD for making nanostructured materials is exemplified by many ways: making of nanolaminates, deposition of thin films inside nanopores, as well as coating of nanofibers and nanorods. The materials deposited by ALD are mostly oxides, nitrides and metals.

Place, publisher, year, edition, pages
2007. Vol. 27, no 5-8, 1504-1508 p.
Keyword [en]
ALD, nanomaterials, nanolaminates, nanofibers, nanotubes, porous materials, thin films
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:uu:diva-151550DOI: 10.1016/j.msec.2006.06.006ISI: 000249476800126OAI: oai:DiVA.org:uu-151550DiVA: diva2:410348
Available from: 2011-04-13 Created: 2011-04-13 Last updated: 2017-12-11Bibliographically approved

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