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Comparison of pulsed dc and rf hollow cathode depositions of Cr and CrN films
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Electricity.
2011 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 205, no 17-18, 4169-4176 p.Article in journal (Refereed) Published
Abstract [en]

A cylindrical chromium hollow cathode powered by a pulsed dc generator working in a constant power mode was used for PVD of chromium and chromium nitride films on silicon substrates in argon and nitrogen plasmas, respectively. A comparison of the pulsed dc process with the radio frequency hollow cathode depositions of Cr and CrN films at identical power levels shows considerable differences particularly in the deposition rate of Cr films. At the pulsed power above 250 W the hot cathode/diffuse arc regimes were reached with the cathode outlet temperature as high as 1300 degrees C and the maximum deposition rates of both Cr and CrN films exceeded 1 mu m/min. The resulting film properties, e.g. the microstructure and morphology were studied and compared with the films obtained by the rf hollow cathode PVD.

Place, publisher, year, edition, pages
2011. Vol. 205, no 17-18, 4169-4176 p.
Keyword [en]
Diffuse arc deposition, Pulsed dc hollow cathode, Radio frequency hollow cathode, Chromium nitride (CrN), Chromium (Cr)
National Category
Natural Sciences Engineering and Technology
Research subject
Engineering Science with specialization in Science of Electricity
Identifiers
URN: urn:nbn:se:uu:diva-155211DOI: 10.1016/j.surfcoat.2011.03.013ISI: 000291295200007OAI: oai:DiVA.org:uu-155211DiVA: diva2:425788
Available from: 2011-06-22 Created: 2011-06-20 Last updated: 2017-12-11Bibliographically approved

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Barankova, HanaBardos, Ladislav

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