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A Simplified Treatment of Target Implantation Effects in Reactive Sputtering
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
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2004 (English)In: The International Conference on Metallurgical Coatings and Thin Films in San Diego, USA, 2004Conference paper, Published paper (Refereed)
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2004.
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URN: urn:nbn:se:uu:diva-15541OAI: oai:DiVA.org:uu-15541DiVA: diva2:43312
Available from: 2008-02-19 Created: 2008-02-19

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Nyberg, TomasKatardjiev, IliaBerg, Sören

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