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Lamb wave resonant pressure micro-sensor utilizing a thin-film aluminium nitride membrane
St Jude Medical, Cardiovascular Division, Uppsala.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
2011 (English)In: Journal of Micromechanics and Microengineering, ISSN 0960-1317, E-ISSN 1361-6439, Vol. 21, no 8, 085010- p.Article in journal (Refereed) Published
Abstract [en]

In this work, pressure sensitivities of aluminium nitride (AlN) thin film plate acoustic resonators (FPAR) operating at the lowest-order symmetric (S0), the first-order asymmetric (A1) as well as the first-order symmetric (S1) Lamb modes are theoretically and experimentally studied in a comparative manner. The finite element method analysis has also been performed to get a further insight into the FPAR pressure sensitivity. The theoretical predictions are found to be in good agreement with the experiment. The S0 Lamb mode is identified as the most pressure-sensitive FPAR mode, while the A1 and S1 modes are found to be much less sensitive. Further, the S0 and the A1 modes exhibit almost equal temperature sensitivities, which can be exploited to eliminate the temperature drift by comparing the resonance frequencies of the latter two modes.

Place, publisher, year, edition, pages
2011. Vol. 21, no 8, 085010- p.
National Category
Engineering and Technology
Research subject
Engineering Science with specialization in Electronics
Identifiers
URN: urn:nbn:se:uu:diva-157028DOI: 10.1088/0960-1317/21/8/085010ISI: 000293163700010OAI: oai:DiVA.org:uu-157028DiVA: diva2:434660
Funder
Swedish Research Council, 2009-5056
Available from: 2011-08-16 Created: 2011-08-15 Last updated: 2017-12-08
In thesis
1. Advanced MEMS Pressure Sensors Operating in Fluids
Open this publication in new window or tab >>Advanced MEMS Pressure Sensors Operating in Fluids
2012 (English)Doctoral thesis, comprehensive summary (Other academic)
Abstract [en]

Today’s MEMS technology allows manufacturing of miniaturized, low power sensors that sometimes exceeds the performance of conventional sensors. The pressure sensor market today is dominated by MEMS pressure sensors.

In this thesis two different pressure sensor techniques are studied. The first concerns ways to improve the sensitivity in the most commonly occurring pressure sensor, namely such based on the piezoresistive technique. Since the giant piezoresistive effect was observed in silicon nanowires, it was assumed that a similar effect could be expected in nano-thin silicon films. However, it turned out that the conductivity was extremely sensitive to substrate bias and could therefore be controlled by varying the backside potential. Another important parameter was the resistivity time drift. Long time measurements showed a drastic variation in the resistance. Not even after several hours of measurement was steady state reached. The drift is explained by hole injection into the buried oxide as well as existence of mobile charges. The piezoresistive effect was studied and shown to be of the same magnitude as in bulk silicon. Later research has shown the existence of such an effect where the film thickness has to be less than around 20 nm. 

The second area that has been studied is the pressure sensitivity of in acoustic resonators. Aluminium nitride thin film plate acoustic resonators (FPAR) operating at the lowest-order symmetric (S0), the first-order asymmetric (A1) as well as the first-order symmetric (S1) Lamb modes have been theoretically and experimentally studied in a comparative manner. The S0 Lamb mode is identified as the most pressure sensitive FPAR mode. The theoretical predictions were found to be in good agreement with the experiments. Additionally, the Lamb modes have been tested for their sensitivities to mass loading and their ability to operate in liquids, where the S0 mode showed good results.

Finally, the pressure sensitivity in aluminium nitride thin film bulk wave resonators employing c- and tilted c-axis texture has been studied. The c-axis tilted FBAR demonstrates a substantially higher pressure sensitivity compared to its c-axis oriented counterpart. 

Place, publisher, year, edition, pages
Uppsala: Acta Universitatis Upsaliensis, 2012. 54 p.
Series
Digital Comprehensive Summaries of Uppsala Dissertations from the Faculty of Science and Technology, ISSN 1651-6214 ; 933
Keyword
pressure sensor, piezoresistance, nanofilms, AlN, microacoustic, Lamb wave, thin film, resonator, sensitivity
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
Research subject
Engineering Science with specialization in Electronics
Identifiers
urn:nbn:se:uu:diva-173182 (URN)978-91-554-8369-2 (ISBN)
Public defence
2012-06-05, Polhelmsalen, Ångströmslaboratoriet, Lägerhyddsvägen 1, Uppsala, 10:00 (English)
Opponent
Supervisors
Available from: 2012-05-15 Created: 2012-04-20 Last updated: 2012-08-01Bibliographically approved

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Anderås, EmilKatardjiev, IliaYantchev, Ventsislav

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