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Transparent yttrium hydride thin films prepared by reactive sputtering
Institute for Energy Technology, Kjeller, Norge.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
Institute for Energy Technology, Kjeller, Norge.
Institute for Energy technology, Kjeller, Norge.
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2011 (English)In: Journal of Alloys and Compounds, ISSN 0925-8388, Vol. 509, S812-S816 p.Article in journal (Refereed) Published
Abstract [en]

Metal hydrides have earlier been suggested for utilization in solar cells. With this as a motivation we have prepared thin films of yttrium hydride by reactive magnetron sputter deposition. The resulting films are metallic for low partial pressure of hydrogen during the deposition, and black or yellow-transparent for higher partial pressure of hydrogen. Both metallic and semiconducting transparent YH(x) films have been prepared directly in situ without the need of capping layers and post-deposition hydrogenation. Optically the films are similar to what is found for YH(x) films prepared by other techniques, but the crystal structure of the transparent films differ from the well-known YH(3-eta) phase, as they have an fcc lattice instead of hcp.

Place, publisher, year, edition, pages
2011. Vol. 509, S812-S816 p.
Keyword [en]
Metal hydrides, Semiconductors, Thin films, Vapor deposition, Optical properties, Photoconductivity, Photovoltaics
National Category
Engineering and Technology
Research subject
Engineering Science with specialization in Electronics
URN: urn:nbn:se:uu:diva-161070DOI: 10.1016/j.jallcom.2010.12.032ISI: 000295695500067OAI: oai:DiVA.org:uu-161070DiVA: diva2:456351
Available from: 2011-11-14 Created: 2011-11-07 Last updated: 2012-01-02Bibliographically approved

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Platzer-Björkman, Charlotte
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