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Titanium dioxide thin film growth on silicon (111) by chemical vapor deposition of titanium(IV) isopropoxide
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Physics, Department of Physics. Department of Physics and Materials Science, Physics I. Physics V. Fysik 1.
Department of Physics and Materials Science, Physics I. Physics V.
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2002 (English)In: Journal of Applied Physics, Vol. 92, 3381- p.Article in journal (Refereed) Published
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2002. Vol. 92, 3381- p.
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URN: urn:nbn:se:uu:diva-18419OAI: oai:DiVA.org:uu-18419DiVA: diva2:46191
Available from: 2007-02-09 Created: 2007-02-09 Last updated: 2011-01-13

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Sandell, AAlfredsson, YRensmo, HSiegbahn, H

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