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Myth and facts in the formation of ultrathin Ni-Pt silicide films
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics. (emerging electronics)
2011 (English)In: Invited talk at 15th European Workshop on Materials for Advanced Metallization 2011 (MAM 2011) and Intl. Interconnect Technol. Conf. (IITC),Dresden, Germany, March 6-9, 2011, 2011Conference paper, Published paper (Refereed)
Abstract [en]

This talk will focus on recent advancements in the formation of ultrathin Ni1-xPtx silicide films targeting CMOS technology nodes beyond 22 nm where silicide films much thinner than 10 nm are required according to the technology roadmap.  The past experience in using metal silicides for various generations of CMOS technology indicates that control of silicide formation in the sub-10 nm regime is a foremost urgent issue especially for devices fabricated on UTB/ETB-SOI substrates or with nanowire-Fins.  Our recent results show that both initial metal thickness and Pt fraction in the as-deposited Ni1-xPtx films are critical parameters determining the resultant silicide films in terms of phase formation, film thickness, specific resistivity, interfacial morphology and morphological stability.  The talk will end with the presentation of a novel process for a controllable formation of Ni1-xPtx silicide films below 8 nm in thickness.

Place, publisher, year, edition, pages
2011.
National Category
Other Electrical Engineering, Electronic Engineering, Information Engineering
Research subject
Engineering Science with specialization in Electronics
Identifiers
URN: urn:nbn:se:uu:diva-164137OAI: oai:DiVA.org:uu-164137DiVA: diva2:466635
Conference
Invited talk at 15th European Workshop on Materials for Advanced Metallization 2011 (MAM 2011) and Intl. Interconnect Technol. Conf. (IITC),Dresden, Germany, March 6-9, 2011
Note

Invited talk at 15th European Workshop on Materials for Advanced Metallization 2011 (MAM 2011) and Intl. Interconnect Technol. Conf. (IITC),Dresden, Germany, March 6-9, 2011

Available from: 2011-12-16 Created: 2011-12-16 Last updated: 2016-04-20

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Zhang, Shi-Li

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Citation style
  • apa
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  • nn-NB
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Output format
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  • asciidoc
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