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Structural, electrical, and mechanical properties of nc-TiC/a-SiC nanocomposite thin films
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. oorganisk kemi.
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2005 (English)In: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 23, no 6, 2486-2495 p.Article in journal (Refereed) Published
Abstract [en]

We have synthesized Ti–Si–C nanocomposite thin films by dc magnetron sputtering from a Ti3SiC2 compound target in an Ar discharge on Si(100), Al2O3(0001), and Al substrates at temperatures from room temperature to 300 °C. Electron microscopy, x-ray diffraction, and x-ray photoelectron spectroscopy showed that the films consisted of nanocrystalline (nc-) TiC and amorphous (a-) SiC, with the possible presence of a small amount of noncarbidic C. The growth mode was columnar, yielding a nodular film-surface morphology. Mechanically, the films exhibited a remarkable ductile behavior. Their nanoindentation hardness and E-modulus values were 20 and 290 GPa, respectively. The electrical resistivity was 330 µ cm for optimal Ar pressure (4 mTorr) and substrate temperature (300 °C). The resulting nc-TiC/a-SiC films performed well as electrical contact material. These films' electrical-contact resistance against Ag was remarkably low, 6 µ at a contact force of 800 N compared to 3.2 µ for Ag against Ag. The chemical stability of the nc-TiC/a-SiC films was excellent, as shown by a Battelle flowing mixed corrosive-gas test, with no N, Cl, or S contaminants entering the bulk of the films.

Place, publisher, year, edition, pages
2005. Vol. 23, no 6, 2486-2495 p.
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Inorganic Chemistry
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URN: urn:nbn:se:uu:diva-21045DOI: doi:10.1116/1.2131081OAI: oai:DiVA.org:uu-21045DiVA: diva2:48818
Available from: 2006-12-14 Created: 2006-12-14 Last updated: 2011-01-12

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Wilhelmsson, OlaJansson, Ulf

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