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Ion-Enhanced Plasma Etching of Hafnium Aluminates in Chlorine Based Plasmas
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics. Fasta tillståndets elektronik.
2006 (English)Conference paper, Published paper (Refereed)
Place, publisher, year, edition, pages
2006.
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:uu:diva-23556OAI: oai:DiVA.org:uu-23556DiVA: diva2:51330
Conference
Proc American Vacuum Society 53rd National Symposium, San Francisco
Available from: 2007-01-30 Created: 2007-01-30 Last updated: 2016-06-22

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Blom, Hans-Olof

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CiteExportLink to record
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Citation style
  • apa
  • ieee
  • modern-language-association
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Language
  • de-DE
  • en-GB
  • en-US
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  • nn-NO
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