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Ion-Enhanced Plasma Etching of Hafnium Aluminates in Chlorine Based Plasmas
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics. Fasta tillståndets elektronik.
2006 (English)Conference paper (Refereed)
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Engineering and Technology
URN: urn:nbn:se:uu:diva-23556OAI: oai:DiVA.org:uu-23556DiVA: diva2:51330
Proc American Vacuum Society 53rd National Symposium, San Francisco
Available from: 2007-01-30 Created: 2007-01-30 Last updated: 2016-06-22

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Blom, Hans-Olof
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Solid State Electronics
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