Ion track lithography: novel low-cost process to form deep vertical and high aspect ratio MEMS in flexible laminates
2003 (English)In: DTIP, the symposium on Design, Test, Integration and Packaging of MEMS/MOEMS, Cannes, France, 5-7 May 2003, 2003, 314-320 p.Conference paper (Refereed)
Place, publisher, year, edition, pages
2003. 314-320 p.
Engineering and Technology
IdentifiersURN: urn:nbn:se:uu:diva-23876OAI: oai:DiVA.org:uu-23876DiVA: diva2:51650