Electrochromic properties of nickel oxide based thin films sputter deposited in the presence of water vapor
2012 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 520, no 10, 3839-3842 p.Article in journal (Refereed) Published
Electrochromic nickel oxide based thin films were prepared by reactive RF magnetron sputtering from metallic nickel in the presence of Ar, O-2 and H2O. The water vapor led to enhanced optical modulation and charge capacity. At a wavelength of 550 nm the bleached state transmittance was 0.73 and the transmittance for the colored state was 0.28 and 0.15 for water partial pressures of p(H2O)<10(-3) Pa and p(H2O) similar to 7 x 10(-2) Pa, respectively. The charge densities were 14 and 25 mC/cm(2) for p(H2O)<10(-3) Pa and P-H2O similar to 7 x 10(-2) Pa, respectively. The coloration efficiency was decreased with increased water partial pressure, from about 0.07 to 0.06 cm(2)/mC. Preliminary results show that the H2O promotes an amorphous structure and makes the films increasingly hydrous.
Place, publisher, year, edition, pages
2012. Vol. 520, no 10, 3839-3842 p.
Nickel oxide, Electrochromism, RF magnetron sputtering, Water vapor, Thin film, Optical properties, Charge capacity
Engineering and Technology
Research subject Engineering Science with specialization in Solid State Physics
IdentifiersURN: urn:nbn:se:uu:diva-174595DOI: 10.1016/j.tsf.2011.08.030ISI: 000302973400027OAI: oai:DiVA.org:uu-174595DiVA: diva2:528295