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Thermal decomposition and fractal properties of sputter-deposited platinum oxide thin films
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2012 (English)In: Journal of Materials Research, ISSN 0884-2914, Vol. 27, no 5, 829-836 p.Article in journal (Refereed) Published
Abstract [en]

Porous platinum thin films were prepared by thermal decomposition at temperatures from 25 to 675 degrees C of platinum oxide films deposited by a pulsed reactive sputtering technique. The samples' chemistry and structure were investigated by x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), and x-ray absorption near edge structure (XANES), showing that the decomposition of the oxide begins as low as 400 degrees C and follows a sigmoidal trend with increasing annealing temperature. In the XRD spectra, only an amorphous-like signature was observed for temperatures below 575 degrees C, while Pt 4f XPS showed that the deposited oxide was a mixture of PtO2 and PtO. Pt-L-3 edge XANES and Pt 4f XPS spectra showed that the Pt concentration and electronic structure are predominant for temperatures equal to or above 575 degrees C. The morphologies of the films were investigated by the area-perimeter method from atomic force microscopy and scanning electron microscopy (SEM) images, indicating that the surfaces exhibit a combination of Euclidian and fractal characteristics. Moreover, the thermal evolution of these characteristics indicates the agglomeration of the grains in the film as observed by SEM.

Place, publisher, year, edition, pages
2012. Vol. 27, no 5, 829-836 p.
National Category
Engineering and Technology
URN: urn:nbn:se:uu:diva-175865DOI: 10.1557/jmr.2011.418ISI: 000304064500009OAI: oai:DiVA.org:uu-175865DiVA: diva2:533334
Available from: 2012-06-13 Created: 2012-06-13 Last updated: 2013-01-17Bibliographically approved

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Andersson, Joakim
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Soft X-Ray Physics
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