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Surface oxide on thin films of yttrium hydride studied by neutron reflectometry
Institute for Energy Technology, Kjeller, Norge.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
Institute for Energy Technology, Kjeller, Norge.
Institute for Energy Technology, Kjeller, Norge.
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2012 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 100, no 19, 191604- p.Article in journal (Refereed) Published
Abstract [en]

The applicability of standard methods for compositional analysis is limited for H-containing films. Neutron reflectometry is a powerful, non-destructive method that is especially suitable for these systems due to the large negative scattering length of H. In this work, we demonstrate how neutron reflectometry can be used to investigate thin films of yttrium hydride. Neutron reflectometry gives a strong contrast between the film and the surface oxide layer, enabling us to estimate the oxide thickness and oxygen penetration depths. A surface oxide layer of 5-10nm thickness was found for unprotected yttrium hydride films.

Place, publisher, year, edition, pages
2012. Vol. 100, no 19, 191604- p.
National Category
Electrical Engineering, Electronic Engineering, Information Engineering
Research subject
Engineering Science with specialization in Electronics
Identifiers
URN: urn:nbn:se:uu:diva-176240DOI: 10.1063/1.4714517ISI: 000304108000020OAI: oai:DiVA.org:uu-176240DiVA: diva2:535202
Available from: 2012-06-19 Created: 2012-06-18 Last updated: 2017-12-07Bibliographically approved

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