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Formation of cobalt silicide films by ion beam deposition
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2006 (English)In: Nucl. Instr. and Meth. in Phys. Res., no 242, 602-604 p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
2006. no 242, 602-604 p.
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Engineering and Technology
URN: urn:nbn:se:uu:diva-25860OAI: oai:DiVA.org:uu-25860DiVA: diva2:53634
Available from: 2007-02-14 Created: 2007-02-14 Last updated: 2016-07-12

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