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The influence of the deposition angle on the composition of reactively sputtered thin films
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
1997 (English)In: SURFACE & COATINGS TECHNOLOGY, ISSN 0257-8972, Vol. 94-5, no 1-3, 242-246 p.Article in journal (Other scientific) Published
Abstract [en]

We have performed computer simulations and experimental studies of the compositional behaviour of reactively sputter-deposited films as a function of the deposition angle. The composition of deposited films is essentially determined by the supply rate of

Place, publisher, year, edition, pages
1997. Vol. 94-5, no 1-3, 242-246 p.
Keyword [en]
deposition angle; reactively sputtered thin films; film composition
Identifiers
URN: urn:nbn:se:uu:diva-27367OAI: oai:DiVA.org:uu-27367DiVA: diva2:55262
Note
Addresses: Nyberg T, Univ Uppsala, Dept Solid State Elect, Box 534, S-75121 Uppsala, Sweden. Univ Uppsala, Dept Solid State Elect, S-75121 Uppsala, Sweden. Univ Uppsala, Dept Inorgan Chem, S-75121 Uppsala, Sweden.Available from: 2007-04-26 Created: 2007-04-26 Last updated: 2011-01-15

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