uu.seUppsala University Publications
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics. (Thin Films Group)
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics. (Thin Films Group)
Show others and affiliations
2012 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 206, no 24, 5055-5059 p.Article in journal (Refereed) Published
Abstract [en]

Serial magnetron co-sputtering can be used to increase the deposition rate in reactive deposition of thin films. The increase in deposition rate is achieved by sputtering yield amplification through doping the sputtering target by a heavy element. The dopant is introduced by means of sputtering from an auxiliary target onto a rotating primary magnetron. During sputtering of the primary target, the dopant is implanted into the target surface. Here we present a model describing the serial co-sputtering technique. The model is based on the binary collision approximation and takes into account the dynamical sputtering and mixing at the target surface. As an example, W and Bi doping in reactive sputter deposition of Al2O3 is analyzed. W is shown to be very efficient dopant which can increase the deposition rate for oxide up to 100% with 1.6 at.% of W in the resulting coating. Doping by Bi is not very effective due to the low surface binding energy of Bi. The simulations show that sputtering yield amplification can be realized in the serial co-sputtering setup with rotating magnetrons.

Place, publisher, year, edition, pages
2012. Vol. 206, no 24, 5055-5059 p.
Keyword [en]
Reactive sputtering, Magnetron sputtering, Deposition rate, Oxide thin films, TRIDYN, Sputtering yield amplification
National Category
Engineering and Technology
Research subject
Engineering Science with specialization in Electronics
Identifiers
URN: urn:nbn:se:uu:diva-181406DOI: 10.1016/j.surfcoat.2012.06.005ISI: 000307492500006OAI: oai:DiVA.org:uu-181406DiVA: diva2:557665
Available from: 2012-09-28 Created: 2012-09-24 Last updated: 2017-12-07Bibliographically approved

Open Access in DiVA

No full text

Other links

Publisher's full text

Authority records BETA

Kubart, TomasNyberg, TomasBerg, Sören

Search in DiVA

By author/editor
Kubart, TomasNyberg, TomasBerg, Sören
By organisation
Solid State Electronics
In the same journal
Surface & Coatings Technology
Engineering and Technology

Search outside of DiVA

GoogleGoogle Scholar

doi
urn-nbn

Altmetric score

doi
urn-nbn
Total: 797 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf