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Mechanisms responsible for compositional variations of films sputtered from a WS2 target
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics. (Thin Films Group)
Uppsala University, Disciplinary Domain of Science and Technology, Chemistry, Department of Chemistry - Ångström, Inorganic Chemistry.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Applied Materials Sciences.
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics. (Thin Films Group)
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2012 (English)In: International Conference on Metallurgical Coatings and Thin films (ICMCTF) 23-27/04 2012, San Diego, abstract number:428, 2012Conference paper, Oral presentation only (Refereed)
Abstract [en]

Transition metal dichalcogenides (TMDs) such as WS2 are well-known for their layered structure and solid lubricant properties. However, beside low friction, a solid lubricant coating must also have a long wear life in order to perform well in a tribological situation. Thus, by adding carbon to the material the mechanical properties can be improved. However, when using a magnetron sputtering process, the resulting thin films are found to be sub-stoichiometric with respect to sulphur. This is due to a number of different effects; take-off angle, scattering, different sticking coefficients and energetic particle bombardment of the substrate.

In this work we have used a non-reactive magnetron sputtering process to see how these effects affect the resulting film stoichiometry, and hence the tribological properties. This was done by changing the process pressure, DC-RF power, the location of the substrate (in and off axes) and by adding carbon to the material. Also, a newly developed Monte Carlo computer model is presented which makes it possible to simulate and predict how these changes will affect the resulting film stoichiometry.

Simulations and experiments alike show that by reducing the energetic particle bombardment of the substrate, the S/W ratio increases. Tribological evaluation of the films concludes that an increasing S/W ratio is beneficial as it decreases the coefficient of friction of the films.

Place, publisher, year, edition, pages
2012.
National Category
Engineering and Technology
Research subject
Engineering Science with specialization in Electronics; Engineering Science with specialization in Materials Science
Identifiers
URN: urn:nbn:se:uu:diva-182852OAI: oai:DiVA.org:uu-182852DiVA: diva2:561084
Conference
ICMCTF 2012
Projects
Technical advancement through controlled tribofilms
Available from: 2012-10-17 Created: 2012-10-17 Last updated: 2013-01-07

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Särhammar, ErikNyberg, HaraldKubart, TomasNyberg, TomasJansson, UlfJacobson, Staffan

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