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Sputter-deposited nickel oxide for electrochromic applications
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science.
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1998 (English)In: SOLID STATE IONICS, ISSN 0167-2738, Vol. 115, 449-456 p.Article in journal (Refereed) Published
Abstract [en]

Thin films were produced by sputtering of metallic Ni in Ar/O-2 and Ar/O-2/H-2 atmospheres. Systematic studies of these films were carried out in electrochromic devices with tungsten oxide and either proton or lithium conducting electrolytes. No major

Place, publisher, year, edition, pages
ELSEVIER SCIENCE BV , 1998. Vol. 115, 449-456 p.
Keyword [en]
nickel oxide; thin films; sputtering; electrochromic devices; coloration mechanisms; ELECTRONIC-STRUCTURE; OPTICAL-PROPERTIES; METAL-OXIDES; THIN-FILMS; NIO; WO3
Identifiers
URN: urn:nbn:se:uu:diva-28730OAI: oai:DiVA.org:uu-28730DiVA: diva2:56626
Note
Addresses: Azens A, Univ Uppsala, Dept Mat Sci, POB 534, S-75121 Uppsala, Sweden. Univ Uppsala, Dept Mat Sci, S-75121 Uppsala, Sweden. CoAT AB, S-43632 Askim, Sweden.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-14

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