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Electrical noise in nanocrystalline films
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1998 (English)In: PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, ISSN 0031-8965, Vol. 168, no 2, R9-R10 p.Article in journal (Other scientific) Published
Place, publisher, year, edition, pages
1998. Vol. 168, no 2, R9-R10 p.
Keyword [en]
1/F NOISE; GAS DEPOSITION; FLUCTUATIONS; ALUMINUM
Identifiers
URN: urn:nbn:se:uu:diva-28735OAI: oai:DiVA.org:uu-28735DiVA: diva2:56631
Note
Addresses: Ochs E, Max Planck Inst Met Forsch, Heisenbergstr 1, D-70569 Stuttgart, Germany. Max Planck Inst Met Forsch, D-70569 Stuttgart, Germany. Univ Uppsala, Dept Mat Sci, S-75121 Uppsala, Sweden.Available from: 2004-10-13 Created: 2004-10-13 Last updated: 2011-01-14

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