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Surface roughness of oxidized copper films studied by atomic force microscopy and spectroscopic light scattering
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science.
1998 (English)In: THIN SOLID FILMS, ISSN 0040-6090, Vol. 325, no 1-2, 92-98 p.Article in journal (Refereed) Published
Abstract [en]

The interface roughness of Cu2O films produced by thermal oxidation of Cu was studied by spectroscopic elastic light scattering and atomic force microscopy. No correlation could be found between the roughness of the two interfaces, although the amplitude

Place, publisher, year, edition, pages
ELSEVIER SCIENCE SA , 1998. Vol. 325, no 1-2, 92-98 p.
Keyword [en]
atomic force microscopy; oxidation; reflection spectroscopy; surface roughness; OPTICAL MULTILAYERS; OXIDIZED METALS; THIN-FILMS; MODEL; SAMPLES
URN: urn:nbn:se:uu:diva-28743OAI: oai:DiVA.org:uu-28743DiVA: diva2:56639
Addresses: Ronnow D, Max Planck Inst Festkorperforsch, Heisenbergstr 1, D-70569 Stuttgart, Germany. Max Planck Inst Festkorperforsch, D-70569 Stuttgart, Germany. Univ Uppsala, Dept Mat Sci, S-75121 Uppsala, Sweden.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-14

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