Surface roughness of oxidized copper films studied by atomic force microscopy and spectroscopic light scattering
1998 (English)In: THIN SOLID FILMS, ISSN 0040-6090, Vol. 325, no 1-2, 92-98 p.Article in journal (Refereed) Published
The interface roughness of Cu2O films produced by thermal oxidation of Cu was studied by spectroscopic elastic light scattering and atomic force microscopy. No correlation could be found between the roughness of the two interfaces, although the amplitude
Place, publisher, year, edition, pages
ELSEVIER SCIENCE SA , 1998. Vol. 325, no 1-2, 92-98 p.
atomic force microscopy; oxidation; reflection spectroscopy; surface roughness; OPTICAL MULTILAYERS; OXIDIZED METALS; THIN-FILMS; MODEL; SAMPLES
IdentifiersURN: urn:nbn:se:uu:diva-28743OAI: oai:DiVA.org:uu-28743DiVA: diva2:56639
Addresses: Ronnow D, Max Planck Inst Festkorperforsch, Heisenbergstr 1, D-70569 Stuttgart, Germany. Max Planck Inst Festkorperforsch, D-70569 Stuttgart, Germany. Univ Uppsala, Dept Mat Sci, S-75121 Uppsala, Sweden.2008-10-172008-10-172011-01-14