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High-rate dual-target dc magnetron sputter deposition of electrochromic MoO3 films
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science.
1997 (English)In: THIN SOLID FILMS, ISSN 0040-6090, Vol. 295, no 1-2, 117-121 p.Article in journal (Refereed) Published
Abstract [en]

Mo oxide films with good electrochromic properties were produced by single-target and dual-target reactive d.c. magnetron sputtering. Dual-target deposition was shown capable of yielding optically functional films at a rate similar to 20 times higher

Place, publisher, year, edition, pages
ELSEVIER SCIENCE SA LAUSANNE , 1997. Vol. 295, no 1-2, 117-121 p.
Keyword [en]
molybdenum oxide; optical properties; sputtering; CHEMICAL-VAPOR-DEPOSITION; OXIDE THIN-FILMS; MOLYBDENUM-OXIDE; METAL-OXIDES; ELECTRODEPOSITION; PHOTOCHROMISM; SPECTROSCOPY; TUNGSTEN; WO3
Identifiers
URN: urn:nbn:se:uu:diva-28779OAI: oai:DiVA.org:uu-28779DiVA: diva2:56675
Note
Addresses: Kharrazi M, UNIV UPPSALA, DEPT MAT SCI, POB 534, S-75121 UPPSALA, SWEDEN.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-15

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