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Quartz micromachining by lithographic control of ion track etching
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. MATERIALS SCIENCE/MST.
1996 (English)In: APPLIED PHYSICS LETTERS, ISSN 0003-6951, Vol. 69, no 22, 3435-3436 p.Article in journal (Other scientific) Published
Abstract [en]

A micromachining process, using ion track etching in combination with lithographic patterning, is presented. The technique employs a substrate pre-irradiated with swift heavy ions and uses a conventional Lithographic technique to control the access of a t

Place, publisher, year, edition, pages
AMER INST PHYSICS , 1996. Vol. 69, no 22, 3435-3436 p.
Identifiers
URN: urn:nbn:se:uu:diva-28789OAI: oai:DiVA.org:uu-28789DiVA: diva2:56685
Note
Addresses: Hjort K, UNIV UPPSALA, DIV MAT SCI, BOX 534, S-75121 UPPSALA, SWEDEN. GSI DARMSTADT, D-64291 DARMSTADT, GERMANY.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-15

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