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Properties of TiN and CrN coatings deposited at low temperature using reactive arc-evaporation
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. MATERIALS SCIENCE/TRIBOMATERIALS.
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1995 (English)In: SURFACE & COATINGS TECHNOLOGY, ISSN 0257-8972, Vol. 76, no 1-3, 174-180 p.Article in journal (Other scientific) Published
Abstract [en]

PVD TiN and CrN coatings were deposited at both low (approximate to 200 degrees C) and standard temperatures (approximate to 400 degrees C) using reactive arc-evaporation Variations in microstructure (obtained by TEM and XRD), morphology (studied using SE

Place, publisher, year, edition, pages
ELSEVIER SCIENCE SA LAUSANNE , 1995. Vol. 76, no 1-3, 174-180 p.
Keyword [en]
low temperature; PVD; TIN; CrN; arc-evaporation; PHYSICAL VAPOR-DEPOSITION; TITANIUM NITRIDE COATINGS; RESISTANCE
Identifiers
URN: urn:nbn:se:uu:diva-28798OAI: oai:DiVA.org:uu-28798DiVA: diva2:56694
Note
Addresses: Gahlin R, UNIV UPPSALA, DEPT TECHNOL, DIV MAT SCI, BOX 534, S-75121 UPPSALA, SWEDEN. TIXON AB, S-58273 LINKOPING, SWEDEN.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-16

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