Fractal surface dimension from cyclic I-V studies and Atomic Force Microscopy; Role of non-contiguous reaction sites
1996 (English)In: Physical Review B. Condensed Matter and Materials Physics, ISSN 1098-0121, E-ISSN 1550-235X, Vol. 54, no 24, 17884-17887 p.Article in journal (Refereed) Published
Films of In oxide and Sn oxyfluoride were made by magnetron sputtering and spray pyrolysis, respectively. Cyclic voltammetry on films in contact with an electrolyte, and atomic-force microscopy (AFM) on as-deposited films, showed that the fractal dimension obtained from the voltammetric peak-current technique is in excellent agreement with the fractal hillock distribution received via the mass-radius method applied to thresholded AFM images.
Place, publisher, year, edition, pages
1996. Vol. 54, no 24, 17884-17887 p.
Engineering and Technology
IdentifiersURN: urn:nbn:se:uu:diva-29743DOI: 10.1103/PhysRevB.54.17884PubMedID: 9985921OAI: oai:DiVA.org:uu-29743DiVA: diva2:57639