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Fractal surface dimension from cyclic I-V studies and Atomic Force Microscopy; Role of non-contiguous reaction sites
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Materials Science.ORCID iD: 0000-0002-5496-9664
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Materials Science.ORCID iD: 0000-0002-8279-5163
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Materials Science.
1996 (English)In: Physical Review B. Condensed Matter and Materials Physics, ISSN 1098-0121, E-ISSN 1550-235X, Vol. 54, no 24, 17884-17887 p.Article in journal (Refereed) Published
Abstract [en]

Films of In oxide and Sn oxyfluoride were made by magnetron sputtering and spray pyrolysis, respectively. Cyclic voltammetry on films in contact with an electrolyte, and atomic-force microscopy (AFM) on as-deposited films, showed that the fractal dimension obtained from the voltammetric peak-current technique is in excellent agreement with the fractal hillock distribution received via the mass-radius method applied to thresholded AFM images.

Place, publisher, year, edition, pages
1996. Vol. 54, no 24, 17884-17887 p.
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:uu:diva-29743DOI: 10.1103/PhysRevB.54.17884PubMedID: 9985921OAI: oai:DiVA.org:uu-29743DiVA: diva2:57639
Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2017-12-07Bibliographically approved

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Strömme, MariaNiklasson, Gunnar A.Granqvist, Claes-Göran

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